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US Patent Issued to JUSUNG ENGINEERING on Oct. 20 for "Thin film deposition method" (South Korean Inventors)

ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,772,759, issued on Oct. 20, was assigned to JUSUNG ENGINEERING Co. LTD. (South Korea). "Thin film deposition method" was invented by Yoon Jeong... और पढ़ें


US Patent Issued to ASM IP Holding on Oct. 20 for "Methods of filling trenches on substrate surface" (Japanese Inventors)

ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,772,760, issued on Oct. 20, was assigned to ASM IP Holding B.V. (Almere, Netherlands). "Methods of filling trenches on substrate surface" was i... और पढ़ें


US Patent Issued to Applied Materials on Oct. 20 for "Growth monitor system and methods for film deposition" (California Inventors)

ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,772,761, issued on Oct. 20, was assigned to Applied Materials Inc. (Santa Clara, Calif.). "Growth monitor system and methods for film depositio... और पढ़ें


US Patent Issued to Tokyo Electron on Oct. 20 for "Substrate processing method and substrate processing apparatus" (Japanese Inventors)

ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,772,762, issued on Oct. 20, was assigned to Tokyo Electron Ltd. (Tokyo). "Substrate processing method and substrate processing apparatus" was i... और पढ़ें


US Patent Issued to ASM IP Holding on Oct. 20 for "Deposition of flowable SiCN films by plasma enhanced atomic layer deposition" (Japanese, Belgian Inventors)

ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,772,763, issued on Oct. 20, was assigned to ASM IP Holding B.V. (Almere, Netherlands). "Deposition of flowable SiCN films by plasma enhanced at... और पढ़ें


US Patent Issued to Applied Materials, National University of Singapore on Oct. 20 for "Methods of forming conformal silicon oxycarbonitride thin films on high aspect ratio semiconductor structures" (Singaporean, American Inventors)

ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,772,764, issued on Oct. 20, was assigned to Applied Materials Inc. (Santa Clara, Calif.) and National University of Singapore (Singapore). "Met... और पढ़ें


US Patent Issued to COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES on Oct. 20 for "Surface treatment method" (French Inventors)

ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,772,765, issued on Oct. 20, was assigned to COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES (Paris). "Surface treatment method" ... और पढ़ें


US Patent Issued to Applied Materials on Oct. 20 for "Substrate stress management using direct selective area processing" (Massachusetts Inventor)

ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,772,766, issued on Oct. 20, was assigned to Applied Materials Inc. (Santa Clara, Calif.). "Substrate stress management using direct selective a... और पढ़ें


US Patent Issued to NANYA TECHNOLOGY on Oct. 20 for "Method of manufacturing semiconductor structure" (Taiwanese Inventor)

ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,772,767, issued on Oct. 20, was assigned to NANYA TECHNOLOGY Corp. (New Taipei City, Taiwan). "Method of manufacturing semiconductor structure"... और पढ़ें


US Patent Issued to Kioxia on Oct. 20 for "Semiconductor manufacturing apparatus and method of processing object" (Japanese Inventor)

ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,772,768, issued on Oct. 20, was assigned to Kioxia Corp. (Tokyo). "Semiconductor manufacturing apparatus and method of processing object" was i... और पढ़ें